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중앙대학교 창의ICT공과대학 전자전기공학부

논문[241]

#241. Plasma etching and surface characteristics depending on the crystallinity of the BaTiO3 thin film

2022.12 · Materials Research Express

(DOI) https://doi.org/10.1088/2053-1591/aca9a9

#240. Etching characteristics and surface properties of fluorine-doped tin oxide thin films under CF4-based plasma treatment

2022.9.30 · Applied Physics A

(DOI) https://doi.org/10.1007/s00339-022-06082-y