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논문[476]
#476. Low temperature silicon nitride grown by very high frequency (VHF, 162MHz) plasma enhanced atomic layer deposition with floating multi-tile electrode
2022.10 · Surfaces and Interfaces
(DOI) https://doi.org/10.1016/j.surfin.2022.102219
#475. Atomic layer etching of Sn by surface modification with H and Cl radicals
2022.10 · Nanotechnology
(DOI) https://doi.org/10.1088/1361-6528/ac9981
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프로시딩[1]
#1. A team-based firefighter training platform using the virtual environment
2010.1
(DOI) https://doi.org/10.1145/1900179.1900242
발표[17]
#17. Characteristics of Plasma-activated Dielectric Film Surfaces for Direct Wafer Bonding
2020 IEEE 70th Electronic Components and Technology Conference (ECTC)
2020.6
#16. Novel damage-free high-k removal for sub-32nm metal gate/high-k LSTP CMOSFETs using neutral beam-assisted atomic layer etching
Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications
2011.4
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PARK Jongha
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Sunjae Lee
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sunghui lee
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SEUNG WOO HAN
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KWON SEONGHEE
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